Probing the Atomic-Scale Structure of Amorphous Aluminum Oxide Grown by Atomic Layer Deposition

نویسندگان
چکیده

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Atomic Layer Deposition of Aluminum Oxide

I Acknowledgements II Dedication III List of Figures V

متن کامل

Atomic Layer Deposition of Praseodymium Aluminum Oxide for Electrical Applications

Praseodymium aluminum oxide (PAO) thin films were grown by atomic layer deposition (ALD) from a new precursor, tris(N,N′-diisopropylacetamidinato) praseodymium, (Pr(amd)3), trimethylaluminum (TMA), and water. Smooth, amorphous films having varying compositions of the general formula PrxAl2–xO3 were deposited on HF-last silicon and analyzed for physical and electrical characteristics. The films ...

متن کامل

Anodic Aluminum Oxide Templated Channel Electrodes via Atomic Layer Deposition

Dye-sensitized solar cells (DSSCs) utilize high surface area metal oxide sintered particle networks to absorb molecular dyes and transport injected charge carriers. While this sintered particle architecture allows liquid electrolyte DSSCs to achieve efficiencies up to 11%, slow charge transport through the semiconductor network limits the amount of modification that can be made to the electroly...

متن کامل

(Sn,Al)Ox Films Grown by Atomic Layer Deposition

Tin oxide (SnO2) is a transparent semiconductor with a wide band gap and electrical resistivity as low as 2 10 4 Ω 3 cm and high infrared reflectivity, over 90%. 4 These properties are achieved using n-type doping by substituting fluorine for about 1% of the oxygen. The low electrical resistance and optical transparency in SnO2 are widely used in applications such as solar cells, displays, touc...

متن کامل

Ultrathin oxide films by atomic layer deposition on graphene.

In this paper, a method is presented to create and characterize mechanically robust, free-standing, ultrathin, oxide films with controlled, nanometer-scale thickness using atomic layer deposition (ALD) on graphene. Aluminum oxide films were deposited onto suspended graphene membranes using ALD. Subsequent etching of the graphene left pure aluminum oxide films only a few atoms in thickness. A pr...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: ACS Applied Materials & Interfaces

سال: 2020

ISSN: 1944-8244,1944-8252

DOI: 10.1021/acsami.0c01905